Factories clean their water,
but not all of it.
And it is poisoning our planet,
slowly.
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Vāsuqi
Vāsuqi
Light in, clean water out.
Vāsuqi

Vāsuqi

Pronounced VAH-su-kee

Vāsuqi is building a visible-light polishing platform for industrial water and wastewater, focused on the difficult residual fraction left behind after conventional treatment has done the heavy lifting.

We aim to destroy what others concentrate, adsorb, or leave behind.
Problem

Industrial wastewater is usually cleaned in stages. The last fraction is where it gets expensive.

  • Biology, membranes, and sometimes thermal treatment remove most of the organic burden.
  • What remains is often residual COD made up of recalcitrant or refractory organics — dissolved compounds that resist normal treatment.
  • The last 5–10% is small in volume, but brutal in cost: more polishing, more handling, more energy, less room for compromise.
Residual load map COD, stubbornness, cost
LAST 5% ORGANIC LOAD
Remaining COD
CAPEX / OPEX
Stubbornness of organic pollutants
Residual COD falls as treatment intensifies.
Treatment cost rises sharply chasing the final fraction.
Where Vāsuqi fits

Vāsuqi is a polishing step for the expensive tail-end of the treatment train.

Upstream treatment removes most of the burden. Vāsuqi is positioned as a downstream polishing step for the expensive tail-end of the train, where residual dissolved organics still drive tertiary polishing, evaporation, disposal, and process complexity.

Treatment fit Lower OPEX. Fewer steps. Cleaner water.
Expensive tail-end

Upstream

Process conditioning

Primary

Front-end removal

Secondary

Biological treatment

Tertiary

UF + RO

Evaporator

Thermal polishing

Disposal

Residual handling
Support reuse inside the process

Recover cleaner water quality back into the plant instead of consuming more fresh water than necessary.

Improve final discharge quality

Polish the stream where residual dissolved organics still stand between the plant and cleaner discharge.

Cut hauling and disposal burden

Reduce the logistics, trucking, and handling pain associated with the hard residual tail-end.

Reduce dependence on expensive tail-end equipment

Take pressure off the polishing steps where OPEX escalates fastest for the last difficult organic fraction.

In plain terms: upstream treatment does the heavy lifting, and Vāsuqi is being developed for the downstream polishing problem that still remains when conventional treatment has already done most of the work.
How it works

Light activates the polishing step. The reaction stays where it matters.

Pre-treated water enters a contained polishing module. Visible light activates the internal reaction zone, where the difficult residual organic fraction is broken down before cleaner effluent exits.

Technology under development — first prototypes expected later this year
Contained polishing moduleVisible-light activated

Effluent inlet

Pre-treated water enters after upstream treatment has already removed most of the organic burden.

Why the module matters

  • Contained polishing step inside the process flow.
  • Continuous contact with the active treatment surface.
  • No separate catalyst recovery step.
Light-activated reaction zone

Activated internal reaction zone

Visible light activates the internal treatment zone, keeping contact and reaction concentrated inside the module.

Treated outlet

Cleaner effluent exits with the difficult residual organic fraction reduced at the polishing stage.

Built by

Built by operators, not observers.

Vāsuqi is founder-led and built by people who understand industrial water, technology development, and what it takes to turn a deep-tech concept into engineered reality.

Stage

Pre-seed. Not pre-ambition.

Vāsuqi is currently pre-seed, with first prototypes for real effluent tests expected later this year.

BII
BIIEcosystem partner
DTU
DTUResearch partner
IFD
InnofounderInnovation Fund Denmark
Contact

Curious what comes after conventional treatment?

If you are an investor, researcher, operator, or simply curious about what we are building, reach out.

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